发明申请
US20120312501A1 METHOD AND APPARATUS FOR TREATMENT OF SELF-ASSEMBLABLE POLYMER LAYERS FOR USE IN LITHOGRAPHY
有权
用于处理自组装聚合物层的方法和装置,用于在LITHOGRAPHY中使用
- 专利标题: METHOD AND APPARATUS FOR TREATMENT OF SELF-ASSEMBLABLE POLYMER LAYERS FOR USE IN LITHOGRAPHY
- 专利标题(中): 用于处理自组装聚合物层的方法和装置,用于在LITHOGRAPHY中使用
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申请号: US13580356申请日: 2011-01-06
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公开(公告)号: US20120312501A1公开(公告)日: 2012-12-13
- 发明人: Roelof Koole , Vadim Yevgenyevich Banine , Sander Frederik Wuister , Emiel Peeters
- 申请人: Roelof Koole , Vadim Yevgenyevich Banine , Sander Frederik Wuister , Emiel Peeters
- 申请人地址: IL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: IL Veldhoven
- 国际申请: PCT/EP2011/050126 WO 20110106
- 主分类号: F27D19/00
- IPC分类号: F27D19/00 ; F27D9/00
摘要:
Treatment of a layer comprising self-assemblable polymer at a surface of a substrate is disclosed. In an embodiment, the treatment includes arranging a zone of temperature change to sweep across the layer, wherein a temperature of the layer within the zone differs from an initial temperature of the layer prior to passage of the zone.