Invention Application
- Patent Title: GRAPHENE STRUCTURE AND METHOD OF MANUFACTURING THE GRAPHENE STRUCTURE, AND GRAPHENE DEVICE AND METHOD OF MANUFACTURING THE GRAPHENE DEVICE
- Patent Title (中): 石墨结构和制造石墨结构的方法和石墨装置及其制造方法
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Application No.: US13470487Application Date: 2012-05-14
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Publication No.: US20120326115A1Publication Date: 2012-12-27
- Inventor: Byoung-lyong CHOI , Eun-kyung LEE , Dong-mok WHANG
- Applicant: Byoung-lyong CHOI , Eun-kyung LEE , Dong-mok WHANG
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Priority: KR10-2011-0062482 20110627
- Main IPC: H01L29/12
- IPC: H01L29/12 ; H01L21/20 ; B82Y99/00 ; B82Y40/00
Abstract:
A graphene structure and a method of manufacturing the graphene structure, and a graphene device and a method of manufacturing the graphene device. The graphene structure includes a substrate; a growth layer disposed on the substrate and having exposed side surfaces; and a graphene layer disposed on the side surfaces of the growth layer.
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Information query
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