发明申请
- 专利标题： COMPOUND
- 专利标题（中）： 复合
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申请号： US13510207申请日： 2010-11-18
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公开(公告)号： US20120330047A1公开(公告)日： 2012-12-27
- 发明人: Seiji Shinkai , Shuichi Haraguchi , Tomohiro Shiraki , Masashi Ogawa , Shuhei Nakatani , Kei Sakanoue , Osamu Goto , Hidenobu Kakimoto
- 申请人： Seiji Shinkai , Shuichi Haraguchi , Tomohiro Shiraki , Masashi Ogawa , Shuhei Nakatani , Kei Sakanoue , Osamu Goto , Hidenobu Kakimoto
- 申请人地址： JP Chuo-ku, Tokyo JP Kadoma-shi, Osaka
- 专利权人： SUMITOMO CHEMICAL COMPANY, LIMITED,PANASONIC CORPORATION
- 当前专利权人： SUMITOMO CHEMICAL COMPANY, LIMITED,PANASONIC CORPORATION
- 当前专利权人地址： JP Chuo-ku, Tokyo JP Kadoma-shi, Osaka
- 优先权： JP2009-263203 20091118
- 国际申请： PCT/JP2010/070573 WO 20101118
- 主分类号： C07F7/18
- IPC分类号： C07F7/18
摘要：
A problem of the present invention is to prevent a base layer beneath the layer to be irradiated with light from deterioration in property and a functional thin film from deterioration in property as the fine patterning of a functional film is performed with light irradiation. Means for solving the problem is a compound obtained by dimerizing with light irradiation a compound (A) containing a group that has photosensitivity and can be photodimerized and a group having lyophilicity and a compound (B) containing a group that has photosensitivity and can be photodimerized and a group having liquid-repellency.