Invention Application
- Patent Title: Methods of Removing a Protective Layer
- Patent Title (中): 去除保护层的方法
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Application No.: US13180163Application Date: 2011-07-11
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Publication No.: US20130014780A1Publication Date: 2013-01-17
- Inventor: Dennis L. HOLTERMANN , Tin-Tack Peter CHEUNG , Christopher D. BLESSING , Lawrence E. HUFF , Joseph BERGMEISTER, III , Robert L. HISE , Geoffrey E. SCANLON , David W. Dockter
- Applicant: Dennis L. HOLTERMANN , Tin-Tack Peter CHEUNG , Christopher D. BLESSING , Lawrence E. HUFF , Joseph BERGMEISTER, III , Robert L. HISE , Geoffrey E. SCANLON , David W. Dockter
- Applicant Address: US TX The Woodlands
- Assignee: CHEVRON PHILLIPS CHEMICAL COMPANY LP
- Current Assignee: CHEVRON PHILLIPS CHEMICAL COMPANY LP
- Current Assignee Address: US TX The Woodlands
- Main IPC: C23G1/00
- IPC: C23G1/00 ; C23G1/02
Abstract:
A method of removing a metal protective layer from a surface of a reactor component comprising treating the metal protective layer with one or more chemical removal agents to remove at least a portion of the metal protective layer from the reactor component. A method of removing a metal protective layer from a surface of a reactor component comprising treating the metal protective layer to remove the metal protective layer from the reactor component, and determining a thickness of the reactor component following treatment.
Public/Granted literature
- US08535448B2 Methods of removing a protective layer Public/Granted day:2013-09-17
Information query
