发明申请
- 专利标题: REDUCING OR ELIMINATING THE BLACK MASK IN AN OPTICAL STACK
- 专利标题(中): 在光学堆栈中减少或消除黑色掩蔽
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申请号: US13180394申请日: 2011-07-11
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公开(公告)号: US20130016037A1公开(公告)日: 2013-01-17
- 发明人: Hung-Jen Wang
- 申请人: Hung-Jen Wang
- 申请人地址: US CA San Diego
- 专利权人: QUALCOMM MEMS TECHNOLOGIES, INC.
- 当前专利权人: QUALCOMM MEMS TECHNOLOGIES, INC.
- 当前专利权人地址: US CA San Diego
- 主分类号: G06T1/00
- IPC分类号: G06T1/00 ; B32B37/14 ; B32B37/02 ; G06F3/01 ; G02B26/00
摘要:
A reflective subpixel array may be formed in which an absorption layer is formed on a back substrate, which may obviate the need for a black mask on a front substrate upon which the reflective subpixel array is formed. In some implementations, the black mask layer may be formed only in post areas on the front substrate. The absorption layer may absorb light that enters between subpixel rows and/or columns. The absorption layer may include at least one highly conductive layer that can form part of the signal routing for the display. Conductive spacers may be formed to connect the conductive absorption layer to a conductive layer of the subpixel array.
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