发明申请
US20130022914A1 HOMOADAMANTANE DERIVATIVE, METHOD FOR PRODUCING THE SAME AND PHOTOSENSITIVE MATERIALS FOR PHOTORESIST
审中-公开
羟基衍生物衍生物，其制备方法和光致抗蚀剂的感光材料
- 专利标题： HOMOADAMANTANE DERIVATIVE, METHOD FOR PRODUCING THE SAME AND PHOTOSENSITIVE MATERIALS FOR PHOTORESIST
- 专利标题（中）： 羟基衍生物衍生物，其制备方法和光致抗蚀剂的感光材料
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申请号： US13638979申请日： 2011-03-16
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公开(公告)号： US20130022914A1公开(公告)日： 2013-01-24
- 发明人: Shinji Tanaka , Yoshitaka Uenoyama , Hidetoshi Ono , Naoya Kawano , Katsuki Ito
- 申请人： Shinji Tanaka , Yoshitaka Uenoyama , Hidetoshi Ono , Naoya Kawano , Katsuki Ito
- 申请人地址： JP Tokyo
- 专利权人： IDEMITSU KOSAN CO., LTD.
- 当前专利权人： IDEMITSU KOSAN CO., LTD.
- 当前专利权人地址： JP Tokyo
- 优先权： JP2010-086352 20100402
- 国际申请： PCT/JP2011/001532 WO 20110316
- 主分类号： C07D313/06
- IPC分类号： C07D313/06 ; G03F7/004 ; G03F7/20 ; C08F122/20
摘要：
A homoadamantane derivative represented by the following formula (I): wherein R1 and R2 are independently a hydrogen atom or a linear, branched or cyclic hydrocarbon group having 1 to 6 carbon atoms, x is a hydroxyl group or a halogen atom, and n and m are independently an integer of 0 to 3, provided that n and m are not simultaneously 0.
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