Invention Application
- Patent Title: SUPERWIDE-ANGLE LENS SYSTEM
- Patent Title (中): 超视角镜头系统
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Application No.: US13570389Application Date: 2012-08-09
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Publication No.: US20130038950A1Publication Date: 2013-02-14
- Inventor: Takashi ENOMOTO
- Applicant: Takashi ENOMOTO
- Applicant Address: JP Tokyo
- Assignee: PENTAX RICOH IMAGING COMPANY, LTD.
- Current Assignee: PENTAX RICOH IMAGING COMPANY, LTD.
- Current Assignee Address: JP Tokyo
- Priority: JP2011-176111 20110811
- Main IPC: G02B9/04
- IPC: G02B9/04

Abstract:
A superwide-angle lens system includes a negative first lens group, an aperture diaphragm, and a positive second lens group. The first lens group includes two negative meniscus lens elements, and a positive lens element. The second lens group includes a cemented lens having negative and positive lens elements; and a positive lens element. The following conditions (1) and (2) are satisfied: −1.45
Public/Granted literature
- US08659841B2 Superwide-angle lens system Public/Granted day:2014-02-25
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