发明申请
- 专利标题： Lithographic Apparatus and Method
- 专利标题（中）： 平版印刷设备和方法
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申请号： US13550561申请日： 2012-07-16
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公开(公告)号： US20130044302A1公开(公告)日： 2013-02-21
- 发明人: Heine Melle MULDER , Steven George Hansen , Thijs Johan Henry Hollink
- 申请人： Heine Melle MULDER , Steven George Hansen , Thijs Johan Henry Hollink
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/54
- IPC分类号： G03B27/54 ; G03B27/32
摘要：
A lithographic apparatus includes an illumination system, a patterning device, and a projection system. The illumination system provides a radiation beam. The patterning device imparts the radiation beam with a pattern in its cross-section. The substrate holder holds a substrate. The projection system projects the patterned radiation beam onto a target portion of the substrate. The apparatus is constructed and arranged, at least in use, to image a pattern on to the substrate using radiation having: a bright field intensity distribution in a first direction; and a dark field intensity distribution in second direction, substantially perpendicular to the first direction.
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