发明申请
- 专利标题： SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN
- 专利标题（中）： 盐，光电组合物和生产光电子图案的方法
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申请号： US13589852申请日： 2012-08-20
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公开(公告)号： US20130052588A1公开(公告)日： 2013-02-28
- 发明人: Isao YOSHIDA , Yuichi MUKAI , Koji ICHIKAWA
- 申请人： Isao YOSHIDA , Yuichi MUKAI , Koji ICHIKAWA
- 申请人地址： JP Tokyo
- 专利权人： SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人： SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人地址： JP Tokyo
- 优先权： JP2011-180291 20110822; JP2012-014868 20120127
- 主分类号： C07C309/19
- IPC分类号： C07C309/19 ; G03F7/20 ; G03F7/027
摘要：
A photoresist composition containing a resin that is hardly soluble or insoluble, but which is soluble in an aqueous alkali solution by action of an acid, and a salt represented by formula (I): wherein Q1, Q2, L1, W1, W2, R1, R2, t1 and t2 are defined in the specification, and Z+ represents an organic cation.