Invention Application
- Patent Title: MASK STORAGE DEVICE FOR MASK HAZE PREVENTION AND METHODS THEREOF
- Patent Title (中): 用于掩蔽防护的掩蔽设备及其方法
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Application No.: US13228175Application Date: 2011-09-08
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Publication No.: US20130062243A1Publication Date: 2013-03-14
- Inventor: Yung-Chih CHANG , Chih-Wing CHANG
- Applicant: Yung-Chih CHANG , Chih-Wing CHANG
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Main IPC: B65D85/00
- IPC: B65D85/00 ; B65B5/04
Abstract:
A mask storage device and a method of preventing defect formation on a mask are provided. The method includes providing a mask storage device comprising a first and second shell configured to form a sealed space in a closed state and a desiccant positioned within the mask storage device. The method further includes placing a mask inside the mask storage device and sealing the mask storage device with the mask and desiccant inside the sealed space.
Public/Granted literature
- US08925290B2 Mask storage device for mask haze prevention and methods thereof Public/Granted day:2015-01-06
Information query
IPC分类:
