发明申请
US20130062734A1 CRYSTALLINE FILM, DEVICE, AND MANUFACTURING METHODS FOR CRYSTALLINE FILM AND DEVICE
审中-公开
晶体膜和器件的制造方法和晶体管和器件的制造方法
- 专利标题： CRYSTALLINE FILM, DEVICE, AND MANUFACTURING METHODS FOR CRYSTALLINE FILM AND DEVICE
- 专利标题（中）： 晶体膜和器件的制造方法和晶体管和器件的制造方法
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申请号： US13582532申请日： 2011-03-04
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公开(公告)号： US20130062734A1公开(公告)日： 2013-03-14
- 发明人: Hideo Aida , Natsuko Aota , Hitoshi Hoshino , Kenji Furuta , Tomosaburo Hamamoto , Keiji Honjo
- 申请人： Hideo Aida , Natsuko Aota , Hitoshi Hoshino , Kenji Furuta , Tomosaburo Hamamoto , Keiji Honjo
- 申请人地址： JP Tokyo JP Tokyo
- 专利权人： DISCO CORPORATION,NAMIKI SEIMITSU HOUSEKI KABUSHIKI KAISHA
- 当前专利权人： DISCO CORPORATION,NAMIKI SEIMITSU HOUSEKI KABUSHIKI KAISHA
- 当前专利权人地址： JP Tokyo JP Tokyo
- 优先权： JP2010-049860 20100305
- 国际申请： PCT/JP2011/055085 WO 20110304
- 主分类号： H01L29/20
- IPC分类号： H01L29/20 ; H01L21/205
摘要：
Provided are a crystalline film in which variations in the crystal axis angle after separation from a substrate for epitaxial growth have been eliminated, and various devices in which the properties thereof have been improved by including the crystalline film. And the crystalline film has a thickness of 300 μm or more and 10 mm or less and reformed region pattern is formed in an internal portion of the crystalline film.
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