- 专利标题: Apparatus comprising substrate and conductive layer
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申请号: US13621204申请日: 2012-09-15
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公开(公告)号: US20130064918A1公开(公告)日: 2013-03-14
- 发明人: Hae-sung Kim , Hyoung-soo Ko , Seung-bum Hong , Jin-seung Sohn , Sung-hoon Choa , Chee-kheng Lim
- 申请人: Hae-sung Kim , Hyoung-soo Ko , Seung-bum Hong , Jin-seung Sohn , Sung-hoon Choa , Chee-kheng Lim
- 申请人地址: US CA SCOTTS VALLEY
- 专利权人: SEAGATE TECHNOLOGY LLC
- 当前专利权人: SEAGATE TECHNOLOGY LLC
- 当前专利权人地址: US CA SCOTTS VALLEY
- 优先权: KR10-2006-0055538 20060620; KR10-2006-0125657 20061211
- 主分类号: B29C59/00
- IPC分类号: B29C59/00
摘要:
A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.
公开/授权文献
- US08523555B2 Apparatus comprising substrate and conductive layer 公开/授权日:2013-09-03
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