发明申请
US20130070218A1 SYSTEM FOR REMOVING CONTAMINANT PARTICLES, LITHOGRAPHIC APPARATUS, METHOD FOR REMOVING CONTAMINANT PARTICLES AND METHOD FOR MANUFACTURING A DEVICE
审中-公开
用于除去污染物颗粒的系统，光刻设备，去除污染物颗粒的方法和制造设备的方法
- 专利标题： SYSTEM FOR REMOVING CONTAMINANT PARTICLES, LITHOGRAPHIC APPARATUS, METHOD FOR REMOVING CONTAMINANT PARTICLES AND METHOD FOR MANUFACTURING A DEVICE
- 专利标题（中）： 用于除去污染物颗粒的系统，光刻设备，去除污染物颗粒的方法和制造设备的方法
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申请号： US13580364申请日： 2011-03-03
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公开(公告)号： US20130070218A1公开(公告)日： 2013-03-21
- 发明人: Vladimir Vitalevich Ivanov , Pavel Stanislavovich Antsiferov , Yurii Victorovitch Sidelnikov , Luigi Scaccabarozzi , Hendrik Antony Johannes Neerhof , Andrei Mikhailovich Yakunin , Erik Roelof Loopstra , Vadim Yevgenyevich Banine , Richard Joseph Bruls
- 申请人： Vladimir Vitalevich Ivanov , Pavel Stanislavovich Antsiferov , Yurii Victorovitch Sidelnikov , Luigi Scaccabarozzi , Hendrik Antony Johannes Neerhof , Andrei Mikhailovich Yakunin , Erik Roelof Loopstra , Vadim Yevgenyevich Banine , Richard Joseph Bruls
- 申请人地址： NL Veldhoven,
- 专利权人： ASML Netherland B.V.
- 当前专利权人： ASML Netherland B.V.
- 当前专利权人地址： NL Veldhoven,
- 国际申请： PCT/EP2011/053171 WO 20110303
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; C23F1/08
摘要：
A system for removing contaminant particles from the path of the beam of EUV radiation is provided in which at least a first AC voltage is provided to a pair of electrodes on opposite sides of the path of the beam of EUV radiation as a first stage of a regime of voltages and, as a second stage of the regime of voltages, a DC voltage is provided to the electrodes.