发明申请
- 专利标题: OVER-CURRENT PROTECTION DEVICE
- 专利标题(中): 过流保护装置
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申请号: US13238999申请日: 2011-09-21
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公开(公告)号: US20130070381A1公开(公告)日: 2013-03-21
- 发明人: Yi An SHA , David Shau Chew Wang
- 申请人: Yi An SHA , David Shau Chew Wang
- 申请人地址: TW Hsinchu
- 专利权人: POLYTRONICS TECHNOLOGY CORP.
- 当前专利权人: POLYTRONICS TECHNOLOGY CORP.
- 当前专利权人地址: TW Hsinchu
- 主分类号: H02H9/02
- IPC分类号: H02H9/02
摘要:
An over-current protection device includes a first substrate, a second substrate, a first grating electrode, a second grating electrode and a positive temperature coefficient (PTC) material layer. The first grating electrode and the second grating electrode are formed on the first substrate and are interlaced and spaced on a same plane. The PTC material layer is formed on the first substrate, the first grating electrode and the second grating electrode, and between the first grating electrode and the second grating electrode. In an embodiment, the first grating electrode and the second grating electrode serve as a current input port and a current output port, respectively.
公开/授权文献
- US08687337B2 Over-current protection device 公开/授权日:2014-04-01
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