发明申请
- 专利标题: PATTERN FORMING APPARATUS
- 专利标题(中): 图案形成装置
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申请号: US13428519申请日: 2012-03-23
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公开(公告)号: US20130077066A1公开(公告)日: 2013-03-28
- 发明人: Ryoichi INANAMI , Tetsuro Nakasugi
- 申请人: Ryoichi INANAMI , Tetsuro Nakasugi
- 优先权: JP2011-207681 20110922
- 主分类号: G03B27/74
- IPC分类号: G03B27/74
摘要:
According to one embodiment, a pattern forming apparatus includes a stage provided under a lower surface of a substrate, a probe provided above an upper surface of the substrate, a drive unit which drives at least one of the stage and the probe, a monitor/lithography unit connected to the probe, and a control unit which controls the drive unit and the monitor/lithography unit. The control unit is configured to change a relative position between the probe and the substrate, and form a first pattern in an area direct above a second pattern after detecting the first pattern in the substrate by the probe.
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