发明申请
- 专利标题： DECOMPOSITION/ELIMINATION METHOD USING A PHOTOCATALYTIC MATERIAL
- 专利标题（中）： 使用光催化材料的分解/消除方法
-
申请号： US13701920申请日： 2011-05-30
-
公开(公告)号： US20130078174A1公开(公告)日： 2013-03-28
- 发明人: Teruki Takayasu , Teruo Arai , Kinji Onoda
- 申请人： Teruki Takayasu , Teruo Arai , Kinji Onoda
- 申请人地址： JP Ikoma-city
- 专利权人： SHOWA CO., LTD.
- 当前专利权人： SHOWA CO., LTD.
- 当前专利权人地址： JP Ikoma-city
- 优先权： JP2010-128977 20100604; JP2010-269960 20101203
- 国际申请： PCT/JP2011/062337 WO 20110530
- 主分类号： B01D53/50
- IPC分类号： B01D53/50 ; B01D53/86
摘要：
The present invention provides a new method for decomposing and/or removing hazardous substances using a photocatalytic material. The method of the present invention is sufficiently useful in fields requiring quick decomposition and/or removal of hazardous substances in gas and/or liquid phases. The decomposition method of the present invention using a photocatalytic material enables significantly efficient and rapid decomposition of hazardous substances in gas and/or liquid phases by causing a photocatalytic material to coexist with a dilute hydrogen peroxide solution.
公开/授权文献
信息查询
IPC分类:
