发明申请
US20130089941A1 VAPOR DEPOSITION METHOD, VAPOR DEPOSITION DEVICE AND ORGANIC EL DISPLAY DEVICE
有权
蒸气沉积方法，蒸发沉积装置和有机EL显示装置
- 专利标题： VAPOR DEPOSITION METHOD, VAPOR DEPOSITION DEVICE AND ORGANIC EL DISPLAY DEVICE
- 专利标题（中）： 蒸气沉积方法，蒸发沉积装置和有机EL显示装置
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申请号： US13703873申请日： 2011-08-17
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公开(公告)号： US20130089941A1公开(公告)日： 2013-04-11
- 发明人: Tohru Sonoda , Nobuhiro Hayashi , Shinichi Kawato , Satoshi Inoue
- 申请人： Tohru Sonoda , Nobuhiro Hayashi , Shinichi Kawato , Satoshi Inoue
- 优先权： JP2010-192510 20100830
- 国际申请： PCT/JP2011/068625 WO 20110817
- 主分类号： H01L51/00
- IPC分类号： H01L51/00
摘要：
A vapor deposition source (60), a plurality of control plates (80) and a vapor deposition mask (70) are disposed in this order. A substrate (10) is moved relative to the vapor deposition mask in a state in which the substrate and the vapor deposition mask are spaced apart at a fixed interval. Vapor deposition particles (91) discharged from a vapor deposition source opening (61) of the vapor deposition source pass through neighboring inter-control plate spaces (81) and mask openings (71) formed in the vapor deposition mask, and then adhere to the substrate to form a coating film (90). At least a part of the coating film is formed by the vapor deposition particles that have passed through two or more different inter-control plate spaces. It is thereby possible to form a coating film in which edge blur and variations in the thickness are suppressed.