发明申请
- 专利标题: REPLACEMENT GATE MULTIGATE TRANSISTOR FOR EMBEDDED DRAM
- 专利标题(中): 嵌入式DRAM的更换栅极多晶硅晶体管
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申请号: US13274758申请日: 2011-10-17
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公开(公告)号: US20130092992A1公开(公告)日: 2013-04-18
- 发明人: Josephine B. Chang , Leland Chang , Michael A. Guillorn , Wilfried E. Haensch
- 申请人: Josephine B. Chang , Leland Chang , Michael A. Guillorn , Wilfried E. Haensch
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 主分类号: H01L27/108
- IPC分类号: H01L27/108 ; H01L21/02 ; B82Y99/00
摘要:
A memory cell, an array of memory cells, and a method for fabricating a memory cell with multigate transistors such as fully depleted finFET or nano-wire transistors in embedded DRAM. The memory cell includes a trench capacitor, a non-planar transistor, and a self-aligned silicide interconnect electrically coupling the trench capacitor to the non-planar transistor.
公开/授权文献
- US09368502B2 Replacement gate multigate transistor for embedded DRAM 公开/授权日:2016-06-14
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