Invention Application
US20130098872A1 SWITCHED ELECTRON BEAM PLASMA SOURCE ARRAY FOR UNIFORM PLASMA PRODUCTION
审中-公开
切换电子束等离子体源阵列进行均匀等离子体生产
- Patent Title: SWITCHED ELECTRON BEAM PLASMA SOURCE ARRAY FOR UNIFORM PLASMA PRODUCTION
- Patent Title (中): 切换电子束等离子体源阵列进行均匀等离子体生产
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Application No.: US13595134Application Date: 2012-08-27
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Publication No.: US20130098872A1Publication Date: 2013-04-25
- Inventor: Leonid Dorf , Shahid Rauf , Kenneth S. Collins , Nipun Misra , James D. Carducci , Gary Leray , Kartik Ramaswamy
- Applicant: Leonid Dorf , Shahid Rauf , Kenneth S. Collins , Nipun Misra , James D. Carducci , Gary Leray , Kartik Ramaswamy
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: H05H1/24
- IPC: H05H1/24 ; B44C1/22
Abstract:
An array of electron beam sources surrounding a processing region of a plasma reactor is periodically switched to change electron beam propagation direction and remove or reduce non-uniformities.
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