发明申请
- 专利标题： POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- 专利标题（中）： 积极的组合和绘图过程
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申请号： US13616317申请日： 2012-09-14
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公开(公告)号： US20130101936A1公开(公告)日： 2013-04-25
- 发明人: Ryosuke Taniguchi , Tomohiro Kobayashi , Jun Hatakeyama , Kenji Funatsu , Masahiro Kanayama
- 申请人： Ryosuke Taniguchi , Tomohiro Kobayashi , Jun Hatakeyama , Kenji Funatsu , Masahiro Kanayama
- 申请人地址： JP Tokyo
- 专利权人： SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人： SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人地址： JP Tokyo
- 优先权： JP2011-233564 20111025
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/20
摘要：
A positive resist composition comprising (A) a polymer comprising recurring units containing an acid labile group, recurring units having a lactone ring, and recurring units having an oxirane ring, the polymer being adapted to increase alkaline dissolution under the action of an acid, (B) a photoacid generator, and (C) a solvent forms a fine pattern with improved LWR, improved MEF, rectangular profile, and collapse resistance.
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