发明申请
- 专利标题: SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- 专利标题(中): 半导体器件及其制造方法
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申请号: US13497249申请日: 2011-11-25
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公开(公告)号: US20130105763A1公开(公告)日: 2013-05-02
- 发明人: Huaxiang Yin , Jun Luo , Chao Zhao , Honggang Liu , Dapeng Chen
- 申请人: Huaxiang Yin , Jun Luo , Chao Zhao , Honggang Liu , Dapeng Chen
- 优先权: CN201110339415.8 20111101
- 国际申请: PCT/CN2011/001965 WO 20111125
- 主分类号: H01L29/78
- IPC分类号: H01L29/78 ; H01L21/336 ; B82Y99/00
摘要:
A semiconductor device, which comprises: a semiconductor substrate; a channel region on the semiconductor substrate, said channel region including a quantum well structure; a source region and a drain region on the sides of the channel region; a gate structure on the channel region; wherein the materials for the channel region, the source region and the drain region have different energy bands, and a tunneling barrier structure exists between the source region and the channel region.
公开/授权文献
- US08816326B2 Semiconductor device and manufacturing method thereof 公开/授权日:2014-08-26
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