发明申请
- 专利标题： DUAL ZONE TEMPERATURE CONTROL OF UPPER ELECTRODES
- 专利标题（中）： 上电极双区温度控制
-
申请号： US13420949申请日： 2012-03-15
-
公开(公告)号： US20130126476A1公开(公告)日： 2013-05-23
- 发明人: Alexei Marakhtanov , Rajinder Dhindsa , Ryan Bise , Lumin Li , Sang Ki Nam , Jim Rogers , Eric Hudson , Gerardo Delgadino , Andrew D. Bailey, III , Mike Kellogg , Anthony de la LIera
- 申请人： Alexei Marakhtanov , Rajinder Dhindsa , Ryan Bise , Lumin Li , Sang Ki Nam , Jim Rogers , Eric Hudson , Gerardo Delgadino , Andrew D. Bailey, III , Mike Kellogg , Anthony de la LIera
- 申请人地址： US CA Fremont
- 专利权人： LAM RESEARCH CORPORATION
- 当前专利权人： LAM RESEARCH CORPORATION
- 当前专利权人地址： US CA Fremont
- 主分类号： C23F1/00
- IPC分类号： C23F1/00 ; C23F1/08
摘要：
A system and method of plasma processing includes a plasma chamber including a substrate support and an upper electrode opposite the substrate support, the upper electrode having a plurality of concentric temperature control zones and a controller coupled to the plasma chamber.
公开/授权文献
- US09263240B2 Dual zone temperature control of upper electrodes 公开/授权日：2016-02-16
信息查询
