Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Patent Title (中): LITHOGRAPHIC装置和装置制造方法
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Application No.: US13692865Application Date: 2012-12-03
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Publication No.: US20130128256A1Publication Date: 2013-05-23
- Inventor: Joeri LOF , Joannes Theodoor De Smit , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Hendricus Johannes Maria Meijer , Erik Roelof Loopstra
- Applicant: Joeri LOF , Joannes Theodoor De Smit , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Hendricus Johannes Maria Meijer , Erik Roelof Loopstra
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP02257822.3 20021112; EP03253692.2 20030611
- Main IPC: G03F9/00
- IPC: G03F9/00
Abstract:
A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
Public/Granted literature
- US09195153B2 Lithographic apparatus and device manufacturing method Public/Granted day:2015-11-24
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