发明申请
- 专利标题： MASK AND A PRODUCTION METHOD THEREFOR
- 专利标题（中）： 掩蔽及其生产方法
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申请号： US13816755申请日： 2011-07-28
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公开(公告)号： US20130139830A1公开(公告)日： 2013-06-06
- 发明人: Woon Bong Hwang , Sung Kyu Lee , Byung Rak Park , Sang Min Lee , Jae-Sung Park
- 申请人： Woon Bong Hwang , Sung Kyu Lee , Byung Rak Park , Sang Min Lee , Jae-Sung Park
- 申请人地址： KR Pohang-si, Gyeongsangbuk-do
- 专利权人： POSTECH ACADEMY-INDUSTRY FOUNDATION
- 当前专利权人： POSTECH ACADEMY-INDUSTRY FOUNDATION
- 当前专利权人地址： KR Pohang-si, Gyeongsangbuk-do
- 优先权： KR10-2010-0080392 20100819
- 国际申请： PCT/KR2011/005572 WO 20110728
- 主分类号： A41D13/11
- IPC分类号： A41D13/11 ; A41D27/12
摘要：
A mask and a method of manufacturing the same that intercept a virus are provided. The mask includes: a mask body; an exhalation module that is formed at one surface of the mask body; and an inhalation module that is formed at the one surface of the mask body and that includes an inhalation filter. The inhalation filter includes an anodized aluminum oxide film.
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