发明申请
US20130145340A1 Determination Of Uniform Colorability Of Layout Data For A Double Patterning Manufacturing Process
审中-公开
双重图案化制作过程布局数据的均匀着色度的确定
摘要:
Graph structures are obtained corresponding to geometric elements in the lowest hierarchical level of cells in a design of hierarchical layout data. Each graph structure then is analyzed for conflicts that would preclude an error-free partitioning of the represented geometric elements into two complementary sets. If there are no conflicts, then relevant portions of each graph structure are promoted into the corresponding parent cells of the next highest hierarchical level of the hierarchical layout design. This process of obtaining graph structures for cells of a hierarchical level, checking the graph structures to determine if they have conflicts, and promoting relevant portions of the graph structures to the graph structures for the next hierarchical level is iteratively repeated for each level in the hierarchical layout design, until a conflict is detected or until it is determined that no conflicts exist for the graph structure corresponding to the highest level cell.
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