发明申请
- 专利标题： DEVICE FOR PROVIDING A FLOW OF PLASMA
- 专利标题（中）： 用于提供等离子体流动的装置
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申请号： US13495521申请日： 2012-06-13
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公开(公告)号： US20130147340A1公开(公告)日： 2013-06-13
- 发明人: Thomas Bickford Holbeche
- 申请人： Thomas Bickford Holbeche
- 优先权： GB1110282.9 20110617
- 主分类号： H01J37/32
- IPC分类号： H01J37/32
摘要：
A device for forming at an ambient atmospheric pressure a gaseous plasma comprising active species for treatment of a treatment region. The device comprises a plasma cell for forming the gaseous plasma for treating the treatment region. The plasma cell comprises an inlet for receiving gas from a source and an outlet for discharging active species generated in the cell. A dielectric substrate made of a polyimide encloses the flow path for gas conveyed from the inlet to the outlet and an electrode is formed on the dielectric substrate for energising gas along the flow path to form the active species. A protective coating or lining is located on an inner surface of the dielectric substrate for resisting reaction of the active species generated in the plasma cell with the material of the dielectric substrate.
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