发明申请
- 专利标题: INSPECTION SYSTEM, INSPECTION METHOD, AND PROGRAM
- 专利标题(中): 检查系统,检验方法和程序
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申请号: US13817545申请日: 2011-08-01
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公开(公告)号: US20130148116A1公开(公告)日: 2013-06-13
- 发明人: Kazumasa Tanaka
- 申请人: Kazumasa Tanaka
- 申请人地址: JP Tokyo
- 专利权人: HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人: HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2010-217786 20100928
- 国际申请: PCT/JP2011/067598 WO 20110801
- 主分类号: G01N21/95
- IPC分类号: G01N21/95
摘要:
Setting a spatial filter requires repeatedly confirming a scan image through visual inspection by an operator and adjusting the spatial filter. A setting state is also dependent on the operator. Therefore, in the present invention, a scattered light image (beam image) and a diffracted light image (Fourier image) are simultaneously observed, and an intensity profile of the scattered light image (beam image) and an intensity profile of the diffracted light image (Fourier image) are simultaneously monitored. A field of view of a diffracted light image is scanned with only one spatial filter, and a state change with respect to the intensity profiles in the absence of insertion of the spatial filter is detected. A setting condition for a spatial filter is determined on the basis of the detected state change.
公开/授权文献
- US08629979B2 Inspection system, inspection method, and program 公开/授权日:2014-01-14
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