- 专利标题: MAGNETIC STRUCTURES, METHODS OF FORMING THE SAME AND MEMORY DEVICES INCLUDING A MAGNETIC STRUCTURE
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申请号: US13549901申请日: 2012-07-16
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公开(公告)号: US20130175646A1公开(公告)日: 2013-07-11
- 发明人: Kwang-seok Kim , Sung-chul Lee
- 申请人: Kwang-seok Kim , Sung-chul Lee
- 申请人地址: KR Suwon-si
- 专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址: KR Suwon-si
- 优先权: KR10-2012-0002041 20120106
- 主分类号: H01L29/82
- IPC分类号: H01L29/82 ; G11B5/66 ; H01F41/14 ; G11B5/65
摘要:
Magnetic structures, methods of forming the same, and memory devices including a magnetic structure, include a magnetic layer, and a stress-inducing layer on a first surface of the magnetic layer, a non-magnetic layer on a second surface of the magnetic layer. The stress-inducing layer is configured to induce a compressive stress in the magnetic layer. The magnetic layer has a lattice structure compressively strained due to the stress-inducing layer.
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