发明申请
- 专利标题: CLEANING MODULE AND PROCESS FOR PARTICLE REDUCTION
- 专利标题(中): 清洁模块和减少颗粒过程
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申请号: US13749116申请日: 2013-01-24
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公开(公告)号: US20130185884A1公开(公告)日: 2013-07-25
- 发明人: Sen-Hou Ko , Lakshmanan Karuppiah
- 申请人: Sen-Hou Ko , Lakshmanan Karuppiah
- 主分类号: B08B1/00
- IPC分类号: B08B1/00
摘要:
A method and apparatus for cleaning a substrate are provided. In one embodiment, a particle cleaning module is provided that includes a substrate holder and a pad holder disposed in a housing, and an actuator operable to move the pad holder relative to the substrate holder. The substrate holder is configured to retain and rotate a substrate in a substantially vertical orientation. The pad holder has a pad retaining surface that faces the substrate holder in a parallel and spaced apart relation. The pad holder is rotatable on an axis parallel to an axis on which the substrate holder rotates. The actuator is operable to move the pad holder relative to the substrate holder as to change a distance defined between the first axis and the second axis.
公开/授权文献
- US1251514A Rolling-mill. 公开/授权日:1918-01-01