发明申请
US20130213426A1 TWO-STEP NAIL POLISH PRODUCT 审中-公开
两步指甲抛光产品

TWO-STEP NAIL POLISH PRODUCT
摘要:
The present invention relates to a nail polish product, comprising: (1) a base coat composition containing: (i) at least one high gloss film forming agent chosen from a styrene maleic anhydride copolymer; (ii) at least one co-film forming agent chosen from an epoxy resin; (iii) at least one first solvent chosen from at least one volatile solvent and water; (iv) optionally, if water is employed as a first solvent, at least one auxiliary reactive agent chosen from a polyalkyleneamine or a combination of polyalkyleneamine and a polyurethane; (v) optionally, at least one colorant; and (vi) optionally, at least one plasticizer; and (2) a top coat composition containing: (i) at least one second solvent chosen from at least one volatile solvent and water; (ii) at least one main reactive agent chosen from at least one alkoxysilane comprising at least one solubilizing functional group and, if water is employed as a second solvent, at least one polyalkyleneamine or a combination of a polyalkyleneamine and a polyurethane; and (iii) optionally, at least one colorant, wherein the product does not require use of nitrocellulose and can be used to makeup or protect nails.
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