发明申请
- 专利标题: RADICAL GENERATOR AND MOLECULAR BEAM EPITAXY APPARATUS
- 专利标题(中): 辐射发生器和分子束外观设备
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申请号: US13819284申请日: 2011-08-24
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公开(公告)号: US20130220223A1公开(公告)日: 2013-08-29
- 发明人: Masaru Hori , Hiroshi Amano , Hiroyuki Kano , Shoji Den , Koji Yamakawa
- 申请人: Masaru Hori , Hiroshi Amano , Hiroyuki Kano , Shoji Den , Koji Yamakawa
- 申请人地址: JP Yokohama-shi, Aichi JP Miyoshi-shi, Aichi
- 专利权人: KATAGIRI Engineering Co, Ltd.,NU Eco Engineering Co. Ltd.
- 当前专利权人: KATAGIRI Engineering Co, Ltd.,NU Eco Engineering Co. Ltd.
- 当前专利权人地址: JP Yokohama-shi, Aichi JP Miyoshi-shi, Aichi
- 优先权: JP2010-190697 20100827; JP2010-190966 20100827
- 国际申请: PCT/JP2011/004684 WO 20110824
- 主分类号: C30B23/02
- IPC分类号: C30B23/02 ; H05H1/46
摘要:
[Object] To provide a radical generator which can produce radicals at higher density.[Means for Solution] The radical generator includes a supply tube 10 made of SUS, a hollow cylindrical plasma-generating tube 11 which is connected to the supply tube 10 and which is made of pyrolytic boron nitride (PBN). A cylindrical CCP electrode 13 is disposed outside the plasma-generating tube 11. A coil 12 is provided so as to wind about the outer circumference of the plasma-generating tube at the downstream end of the CCP electrode 13. A parasitic-plasma-preventing tube 15 made of a ceramic material is inserted into an opening of the supply tube 10 at the connection site between the supply tube 10 and the plasma-generating tube 11.
公开/授权文献
- US09447518B2 Radical generator and molecular beam epitaxy apparatus 公开/授权日:2016-09-20
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