Invention Application
- Patent Title: CLEANING METHOD OF IMMERSION LIQUID, IMMERSION LIQUID CLEANING COMPOSITION, AND SUBSTRATE
- Patent Title (中): 浸渍液的清洗方法，浸没液清洗组合物和底物
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Application No.: US13856442Application Date: 2013-04-04
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Publication No.: US20130220930A1Publication Date: 2013-08-29
- Inventor: Kentaro HARADA , Goji WAKAMATSU
- Applicant: JSR Corporation
- Applicant Address: JP Tokyo
- Assignee: JSR Corporation
- Current Assignee: JSR Corporation
- Current Assignee Address: JP Tokyo
- Main IPC: B01D15/00
- IPC: B01D15/00 ; C08K5/07 ; C08K5/103
Abstract:
A cleaning method of an immersion liquid includes supplying an immersion liquid on a surface of a cleaning substrate. The immersion liquid is to be used in a liquid immersion lithography apparatus. The cleaning substrate has a substrate and an organic film laminated on a top face side of the substrate. The immersion liquid is allowed to move on the substrate to remove contaminants from the immersion liquid.
Public/Granted literature
- US09259668B2 Cleaning method of immersion liquid, immersion liquid cleaning composition, and substrate Public/Granted day:2016-02-16
Information query
