发明申请
US20130237126A1 System For Machining Seed Rods For Use In A Chemical Vapor Deposition Polysilicon Reactor 有权
用于加工种子棒的系统用于化学气相沉积多晶硅反应器

System For Machining Seed Rods For Use In A Chemical Vapor Deposition Polysilicon Reactor
摘要:
A method for machining a profile into a silicon seed rod using a machine. The silicon seed rod is capable of being used in a chemical vapor deposition polysilicon reactor. The machine includes a plurality of grinding wheels. The method includes grinding a v-shaped profile into a first end of the silicon seed rod with one of the plurality of grinding wheels and grinding a conical profile in a second end of the silicon seed rod with another of the plurality of grinding wheels.
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