发明申请
- 专利标题： CYCLIC CARBOSILANE DIELECTRIC FILMS
- 专利标题（中）： 循环碳化硅电介质膜
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申请号： US13894422申请日： 2013-05-14
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公开(公告)号： US20130249049A1公开(公告)日： 2013-09-26
- 发明人: DAVID J. MICHALAK , JAMES M. BLACKWELL , JAMES S. CLARKE
- 申请人： DAVID J. MICHALAK , JAMES M. BLACKWELL , JAMES S. CLARKE
- 主分类号： H01L21/02
- IPC分类号： H01L21/02 ; H01L29/06
摘要：
Embodiments of the invention provide dielectric films and low-k dielectric films and methods for making dielectric and low-k dielectric films. Dielectric films are made from carbosilane-containing precursors. In embodiments of the invention, dielectric film precursors comprise attached porogen molecules. In further embodiments, dielectric films have nanometer-dimensioned pores.
公开/授权文献
- US09070553B2 Cyclic carbosilane dielectric films 公开/授权日：2015-06-30
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