发明申请
US20130252353A1 VAPOR DEPOSITION METHOD, VAPOR DEPOSITION DEVICE AND ORGANIC EL DISPLAY DEVICE
有权
蒸气沉积方法,蒸发沉积装置和有机EL显示装置
- 专利标题: VAPOR DEPOSITION METHOD, VAPOR DEPOSITION DEVICE AND ORGANIC EL DISPLAY DEVICE
- 专利标题(中): 蒸气沉积方法,蒸发沉积装置和有机EL显示装置
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申请号: US13989053申请日: 2011-12-13
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公开(公告)号: US20130252353A1公开(公告)日: 2013-09-26
- 发明人: Shinichi Kawato , Satoshi Inoue , Tohru Sonoda
- 申请人: Shinichi Kawato , Satoshi Inoue , Tohru Sonoda
- 申请人地址: JP Osaka
- 专利权人: Sharp Kabushiki Kaisha
- 当前专利权人: Sharp Kabushiki Kaisha
- 当前专利权人地址: JP Osaka
- 优先权: JP2010-283476 20101220
- 国际申请: PCT/JP2011/078757 WO 20111213
- 主分类号: H01L21/66
- IPC分类号: H01L21/66
摘要:
A coating film (90) is formed by causing vapor deposition particles (91) discharged from a vapor deposition source opening (61) of a vapor deposition source (60) to pass through a space (82) between a plurality of limiting plates (81) of a limiting plate unit (80) and a mask opening (71) of a vapor deposition mask in this order and adhere to a substrate while the substrate is moved relative to the vapor deposition mask in a state in which the substrate (10) and the vapor deposition mask (70) are spaced apart at a fixed interval. It is determined whether or not it is necessary to correct the position of at least one of the plurality of limiting plates in the X axis direction, and in the case where it is necessary to correct the position, the position of at least one of the plurality of limiting plates in the X axis direction is corrected. Accordingly, a coating film whose edge blur is suppressed can be stably formed at a desired position on a large-sized substrate.