发明申请
- 专利标题: 3-D Integrated Circuits and Methods of Forming Thereof
- 专利标题(中): 3-D集成电路及其形成方法
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申请号: US13437409申请日: 2012-04-02
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公开(公告)号: US20130260510A1公开(公告)日: 2013-10-03
- 发明人: Horst Theuss
- 申请人: Horst Theuss
- 申请人地址: DE Neubiberg
- 专利权人: INFINEON TECHNOLOGIES AG
- 当前专利权人: INFINEON TECHNOLOGIES AG
- 当前专利权人地址: DE Neubiberg
- 主分类号: H01L21/78
- IPC分类号: H01L21/78
摘要:
In one embodiment, a method of forming a semiconductor device includes stacking a second wafer with a first wafer and forming a through via extending through the second wafer while the second wafer is stacked with the first wafer. In another embodiment, a method of forming a semiconductor device includes singulating a first wafer into a first plurality of dies and attaching the first plurality of dies over a second wafer having a second plurality of dies. The method further includes forming a through via extending through a die of the first plurality of dies after attaching the first plurality of dies over the second wafer.
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