发明申请
US20130261257A1 AQUEOUS POLY(METH)ACRYLIC ACID (SALT) SOLUTION AND PROCESS FOR PREPARING SAME
有权
水性聚（甲基）丙烯酸（盐）溶液及其制备方法
- 专利标题： AQUEOUS POLY(METH)ACRYLIC ACID (SALT) SOLUTION AND PROCESS FOR PREPARING SAME
- 专利标题（中）： 水性聚（甲基）丙烯酸（盐）溶液及其制备方法
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申请号： US13991967申请日： 2011-12-21
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公开(公告)号： US20130261257A1公开(公告)日： 2013-10-03
- 发明人: Norihiro Wakao , Akihiko Kanzaki , Junichi Chosa
- 申请人： Norihiro Wakao , Akihiko Kanzaki , Junichi Chosa
- 优先权： JP2010-284162 20101221
- 国际申请： PCT/JP2011/079708 WO 20111221
- 主分类号： C08K3/30
- IPC分类号： C08K3/30 ; C08K3/32
摘要：
An object of the present invention is to provide an aqueous poly(meth)acrylic acid (salt) solution having high dispersibility of inorganic substances and demonstrating dispersibility having sufficient stability over time, and a process for preparing the same.The present invention relates to an aqueous poly(meth)acrylic acid (salt) solution comprising a poly(meth)acrylic acid (salt) having a weight average molecular weight of 1000 to 10000 polymerized in the presence of a phosphorus compound containing hypophosphorous acid (salt), wherein the phosphorus compound contains 0 to 0.3% by mass of a phosphorous acid (salt) based on 100% by mass of the phosphorus compound, and the aqueous poly(meth)acrylic acid (salt) solution contains 0 to 10000 ppm of an inorganic anion; and a process for preparing an aqueous poly(meth)acrylic acid (salt) solution comprising the step of polymerizing a monomer in an aqueous solvent in the presence of a phosphorus compound containing hypophosphorous acid (salt), wherein the monomer contains a (meth)acrylic acid (salt) as an essential component, the phosphorus compound contains 0 to 0.3% by mass of a phosphorous acid (salt) based on 100% by mass of the phosphorus compound, the poly(meth)acrylic acid (salt) has a weight average molecular weight of 1000 to 10000, and the aqueous poly(meth)acrylic acid (salt) solution contains 0 to 10000 ppm of an inorganic anion.