发明申请
- 专利标题: Sputtering Target for Magnetic Recording Film
- 专利标题(中): 磁记录膜溅射靶
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申请号: US13982051申请日: 2012-03-23
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公开(公告)号: US20130306470A1公开(公告)日: 2013-11-21
- 发明人: Shin-ichi Ogino , Yuichiro Nakamura
- 申请人: Shin-ichi Ogino , Yuichiro Nakamura
- 申请人地址: JP Tokyo
- 专利权人: JX NIPPON MINING & METALS CORPORATION
- 当前专利权人: JX NIPPON MINING & METALS CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2011-075566 20110330
- 国际申请: PCT/JP2012/057482 WO 20120323
- 主分类号: C23C14/34
- IPC分类号: C23C14/34
摘要:
A sputtering target for a magnetic recording film which contains carbon, the sputtering target is characterized in that the ratio (IG/ID) of peak intensities of the G-band to the D-band in Raman scattering spectrometry is 5.0 or less. The sputtering target for a magnetic recording film, which contains carbon powders dispersed therein, makes it possible to produce a magnetic thin film having a granular structure without using an expensive apparatus for co-sputtering; and in particular, the target is an Fe—Pt-based sputtering target. Carbon is a material which is difficult to sinter and has a problem that carbon particles are apt to form agglomerates. There is hence a problem that carbon masses are readily detached during sputtering to generate a large number of particles on the film after sputtering. The high-density sputtering target can solve these problems.
公开/授权文献
- US09683284B2 Sputtering target for magnetic recording film 公开/授权日:2017-06-20
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