Invention Application
- Patent Title: DROPLET DISCHARGE DEVICE
- Patent Title (中): 滴液放电装置
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Application No.: US13963340Application Date: 2013-08-09
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Publication No.: US20130323998A1Publication Date: 2013-12-05
- Inventor: Hirofumi SAKAI , Toru SHINOHARA
- Applicant: SEIKO EPSON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: SEIKO EPSON CORPORATION
- Current Assignee: SEIKO EPSON CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2009-121696 20090520
- Main IPC: H05B33/10
- IPC: H05B33/10

Abstract:
A pattern film formation method includes: discharging liquid from at least one first discharge head toward a first pattern film formation region on a substrate; and discharging liquid from a plurality of second discharge heads toward a second pattern film formation region that is narrower than the first pattern film formation region. A number of the second discharge heads is greater than a number of the at least one first discharge head.
Public/Granted literature
- US08757772B2 Droplet discharge device Public/Granted day:2014-06-24
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