发明申请
- 专利标题： RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- 专利标题（中）： 辐射源，光刻设备和器件制造方法
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申请号： US13686633申请日： 2012-11-27
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公开(公告)号： US20130327955A1公开(公告)日： 2013-12-12
- 发明人: Erik Roelof Loopstra , Gerardus Hubertus Petrus Maria Swinkels , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors
- 申请人： Erik Roelof Loopstra , Gerardus Hubertus Petrus Maria Swinkels , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： H05G2/00
- IPC分类号： H05G2/00
摘要：
A radiation source is configured to produce extreme ultraviolet radiation. The radiation source includes a chamber in which, in use, a plasma is generated, and an evaporation surface configured to evaporate a material formed as a by-product from the plasma and that is emitted to the evaporation surface. A method for removing a by-product material in or from a plasma radiation source of a lithographic apparatus includes evaporating a material which, in use, is emitted to that surface from the plasma.