发明申请
US20130337174A1 VAPORIZATION SOURCE, VAPORIZATION CHAMBER, COATING METHOD AND NOZZLE PLATE
审中-公开
蒸发源，蒸发室，涂层方法和喷嘴板
- 专利标题： VAPORIZATION SOURCE, VAPORIZATION CHAMBER, COATING METHOD AND NOZZLE PLATE
- 专利标题（中）： 蒸发源，蒸发室，涂层方法和喷嘴板
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申请号： US13897339申请日： 2013-05-17
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公开(公告)号： US20130337174A1公开(公告)日： 2013-12-19
- 发明人: Christof Goebert , Frank Ulmer , Hendrik Zachmann , Jens Roessler , Heiko Schuler , Frank Huber , Oliver Leifeld
- 申请人： Christof Goebert , Frank Ulmer , Hendrik Zachmann , Jens Roessler , Heiko Schuler , Frank Huber , Oliver Leifeld
- 申请人地址： DE Leipzig
- 专利权人： SOLARION AG - PHOTOVOLTAIK
- 当前专利权人： SOLARION AG - PHOTOVOLTAIK
- 当前专利权人地址： DE Leipzig
- 优先权： DEDE102010055285.2 20101221
- 主分类号： B05B1/00
- IPC分类号： B05B1/00
摘要：
The invention relates to vaporization source, an evaporation chamber, a coating method and a nozzle plate. The vaporization source according to the invention makes it possible to generate a high, stable melt flow rate having improved layer thickness homogeneity under vacuum conditions in a selenium atmosphere. The direction of the molecular flow of the vaporization source can be adjusted with respect to the substrate support located above the vaporization source.