发明申请
US20140010957A1 VAPOR DEPOSITION PARTICLE EMITTING DEVICE, VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD
有权
蒸气沉积颗粒发射装置，蒸气沉积装置，蒸气沉积方法
- 专利标题： VAPOR DEPOSITION PARTICLE EMITTING DEVICE, VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD
- 专利标题（中）： 蒸气沉积颗粒发射装置，蒸气沉积装置，蒸气沉积方法
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申请号： US14004894申请日： 2012-03-07
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公开(公告)号： US20140010957A1公开(公告)日： 2014-01-09
- 发明人: Satoshi Inoue , Shinichi Kawato , Tohru Sonoda
- 申请人： Satoshi Inoue , Shinichi Kawato , Tohru Sonoda
- 申请人地址： JP Osaka
- 专利权人： Sharp Kabushiki Kaisha
- 当前专利权人： Sharp Kabushiki Kaisha
- 当前专利权人地址： JP Osaka
- 优先权： JP2011-055963 20110314
- 国际申请： PCT/JP2012/055800 WO 20120307
- 主分类号： C23C16/448
- IPC分类号： C23C16/448
摘要：
A vapor deposition particle emitting device (30) includes a hollow rotor (40) provided with a first and a second nozzle sections (50 and 60), a rolling mechanism, and heat exchangers (52 and 62), and when the rolling mechanism causes the rotor (40) to rotate, the heat exchangers (52 and 62) switch between cooling and heating in accordance with placement of the nozzle section so that that one of the nozzle sections which faces outward has a temperature lower than a temperature at which vapor deposition material turns into gas and the other nozzle section has a temperature equal to or higher than the temperature at which the vapor deposition material turns into the gas.
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