发明申请
- 专利标题： METHOD OF MAKING SUPEROLEOPHOBIC RE-ENTRANT RESIST STRUCTURES
- 专利标题（中）： 制造超疏水复合材料结构的方法
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申请号： US13550169申请日： 2012-07-16
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公开(公告)号： US20140015900A1公开(公告)日： 2014-01-16
- 发明人: Yuanjia ZHANG , Kyoo-Chul PARK , Hong ZHAO , Kock-Yee LAW
- 申请人： Yuanjia ZHANG , Kyoo-Chul PARK , Hong ZHAO , Kock-Yee LAW
- 申请人地址： US CT Norwalk
- 专利权人： XEROX CORPORATION
- 当前专利权人： XEROX CORPORATION
- 当前专利权人地址： US CT Norwalk
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; B41J2/135
摘要：
A device and method for preparing a device having a superoleophobic surface are disclosed. The method includes providing a substrate; coating a lift-off resist layer on the substrate; baking the lift-off resist layer; layering a photoresist layer on the lift-off resist layer; performing photolithography to create a textured pattern in the photoresist layer and the lift-off resist layer, and chemically modifying the textured pattern to create a superoleophobic surface.
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