Invention Application
US20140034684A1 TARGET SUPPLY APPARATUS, CONTROL SYSTEM, CONTROL APPARATUS AND CONTROL CIRCUIT THEREOF
有权
目标供应装置,控制系统,控制装置及其控制电路
- Patent Title: TARGET SUPPLY APPARATUS, CONTROL SYSTEM, CONTROL APPARATUS AND CONTROL CIRCUIT THEREOF
- Patent Title (中): 目标供应装置,控制系统,控制装置及其控制电路
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Application No.: US14047895Application Date: 2013-10-07
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Publication No.: US20140034684A1Publication Date: 2014-02-06
- Inventor: Takanobu ISHIHARA , Hiroshi ITAFUJI
- Applicant: CKD CORPORATION , GIGAPHOTON, INC.
- Applicant Address: JP Aichi JP Tochigi
- Assignee: CKD CORPORATION,GIGAPHOTON, INC.
- Current Assignee: CKD CORPORATION,GIGAPHOTON, INC.
- Current Assignee Address: JP Aichi JP Tochigi
- Priority: JP2008-328274 20081224; JP2009-288898 20091221
- Main IPC: H05G2/00
- IPC: H05G2/00

Abstract:
A target supply apparatus includes a tank for storing a liquid target material, a nozzle for outputting the liquid target material in the tank, and a gas supply source for supplying gas into the tank, and controls a gas pressure inside the tank with a pressure of the gas supplied from the gas supply source which is provided with a pressure regulator. The target supply apparatus also includes a pressure-decrease gas passage of which one end is connected to the tank and the other end forms an exhaust port, a pressure-decrease valve provided on the pressure-decrease gas passage, and a controller for controlling open/close of the pressure-decrease valve. The controller, when the target material is caused not to output from the nozzle, opens the pressure-decrease valve and decreases the pressure inside the tank.
Public/Granted literature
- US09192038B2 Target supply apparatus, control system, control apparatus and control circuit thereof Public/Granted day:2015-11-17
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