Invention Application
US20140035458A1 PLASMA REACTOR WITH ELECTRON BEAM PLASMA SOURCE HAVING A UNIFORM MAGNETIC FIELD
有权
具有均匀磁场的电子束等离子体源的等离子体反应器
- Patent Title: PLASMA REACTOR WITH ELECTRON BEAM PLASMA SOURCE HAVING A UNIFORM MAGNETIC FIELD
- Patent Title (中): 具有均匀磁场的电子束等离子体源的等离子体反应器
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Application No.: US13945200Application Date: 2013-07-18
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Publication No.: US20140035458A1Publication Date: 2014-02-06
- Inventor: Ming-Feng Wu , Ajit Balakrishna , Leonid Dorf , Shahid Rauf , Kenneth S. Collins , Nipun Misra
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: H01J37/32
- IPC: H01J37/32
Abstract:
Electron beam-confining electromagnets of an electron beam generator are aligned with an electron beam axis, each of the electromagnets being folded to define a main section and a pair of angled wing sections disposed at respective angles relative to said main section, and a conductor wound around the edge.
Public/Granted literature
- US09269546B2 Plasma reactor with electron beam plasma source having a uniform magnetic field Public/Granted day:2016-02-23
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