发明申请
- 专利标题: PLASMA GENERATOR
- 专利标题(中): 等离子发生器
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申请号: US14029196申请日: 2013-09-17
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公开(公告)号: US20140042902A1公开(公告)日: 2014-02-13
- 发明人: Hideki FUJITA , Tetsuya IGO
- 申请人: NISSIN ION EQUIPMENT CO., LTD
- 申请人地址: JP Kyoto-shi
- 专利权人: NISSIN ION EQUIPMENT CO., LTD
- 当前专利权人: NISSIN ION EQUIPMENT CO., LTD
- 当前专利权人地址: JP Kyoto-shi
- 优先权: JP2010-186824 20100824
- 主分类号: H05H1/46
- IPC分类号: H05H1/46
摘要:
A plasma generator generates a plasma by ionizing a gas with a high-frequency discharge in a plasma generating chamber so that electrons from the plasma are emitted outside the plasma generator through an electron emitting hole. The plasma generator includes an antenna that is provided in the plasma generating chamber and that emits a high-frequency wave, and an antenna cover that is made of an insulating material and that covers an entire body of the antenna. A plasma electrode having the electron emitting hole is made of a conductive material. A frame cover with a protrusion ensures conductivity by preventing an insulating material from accumulating on a surface of the plasma electrode on a plasma side in sputtering by the plasma.
公开/授权文献
- US08664861B1 Plasma generator 公开/授权日:2014-03-04
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