Invention Application
- Patent Title: Mask Plate, Method For Fabricating Array Substrate Using The Same, And Array Substrate
- Patent Title (中): 掩模板,使用相同阵列基板制造阵列基板的方法
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Application No.: US13974223Application Date: 2013-08-23
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Publication No.: US20140057082A1Publication Date: 2014-02-27
- Inventor: Yanping Liao , Jing LV , Xibin Shao , Daekeun Yoon , Ying Wang , Zhenyu Zhang
- Applicant: Beijing BOE Display Technology Co., Ltd. , BOE Technology Group Co., Ltd.
- Priority: CN201210306678.3 20120824
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F1/00

Abstract:
Embodiments of the invention provide a mask plate, a method for fabricating an array substrate using the mask plate, and an array substrate. The mask plate is used for fabricating the array substrate by a stitching exposure. The mask plate comprises 2n+1 mask patterns successively arranged and parallel to each other, where n is any natural number, each mask pattern includes a light-shielding pattern corresponding to a portion of a data signal line on the array substrate. The light-shielding patterns of two adjacent mask patterns are discontinuous, and the portions on both sides of the light-shielding pattern of the mask pattern located in the middle of the mask plate are asymmetric.
Public/Granted literature
- US09423687B2 Mask plate, method for fabricating array substrate using the same, and array substrate Public/Granted day:2016-08-23
Information query