发明申请
US20140076721A1 ELECTROCHEMICAL ETCHING APPARATUS 有权
电化学蚀刻装置

ELECTROCHEMICAL ETCHING APPARATUS
摘要:
An electroplating etching apparatus includes a power to output current, and a container configured to contain an electrolyte. A cathode is coupled to the container and configured to fluidly communicate with the electrolyte. An anode is electrically connected to the output, and includes a graphene layer. A metal substrate layer is formed on the graphene layer, and is etched from the graphene layer in response to the current flowing through the anode.
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