发明申请
- 专利标题: ELECTROCHEMICAL ETCHING APPARATUS
- 专利标题(中): 电化学蚀刻装置
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申请号: US13617727申请日: 2012-09-14
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公开(公告)号: US20140076721A1公开(公告)日: 2014-03-20
- 发明人: Shu-Jen Han , Lian Guo , Xuesong Li
- 申请人: Shu-Jen Han , Lian Guo , Xuesong Li
- 申请人地址: US NY Armonk
- 专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址: US NY Armonk
- 主分类号: C25F7/00
- IPC分类号: C25F7/00
摘要:
An electroplating etching apparatus includes a power to output current, and a container configured to contain an electrolyte. A cathode is coupled to the container and configured to fluidly communicate with the electrolyte. An anode is electrically connected to the output, and includes a graphene layer. A metal substrate layer is formed on the graphene layer, and is etched from the graphene layer in response to the current flowing through the anode.
公开/授权文献
- US09045842B2 Electrochemical etching apparatus 公开/授权日:2015-06-02
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