Invention Application
- Patent Title: POLYMER INTERLAYERS COMPRISING ANTIBLOCKING LAYERS
- Patent Title (中): 聚合物层间包含防粘层
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Application No.: US14084516Application Date: 2013-11-19
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Publication No.: US20140079928A1Publication Date: 2014-03-20
- Inventor: Chiah-chang Clifford Lin , Ping Yuan
- Applicant: Solutia Inc.
- Applicant Address: US MO St. Louis
- Assignee: SOLUTIA INC.
- Current Assignee: SOLUTIA INC.
- Current Assignee Address: US MO St. Louis
- Main IPC: B32B27/20
- IPC: B32B27/20 ; B32B27/08
Abstract:
The present invention is in the field of polymer interlayers used in multiple layer glass panels, and specifically the present invention is in the field of antiblocking agents for polymer interlayers and methods of effectively incorporating such agents into interlayers.
Public/Granted literature
- US09023463B2 Polymer interlayers comprising antiblocking layers Public/Granted day:2015-05-05
Information query
