Invention Application
- Patent Title: PHOTORESIST DELIVERY SYSTEM INCLUDING CONTROL VALVE AND ASSOCIATED METHODS
- Patent Title (中): 光电传输系统，包括控制阀和相关方法
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Application No.: US13625210Application Date: 2012-09-24
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Publication No.: US20140083557A1Publication Date: 2014-03-27
- Inventor: Gino GEORGE , KeenYip Koh , CheeChiang LEE , Ditto ADNAN
- Applicant: STMICROELECTRONICS PTE LTD.
- Applicant Address: SG Singapore
- Assignee: STMicroelectronics Pte Ltd.
- Current Assignee: STMicroelectronics Pte Ltd.
- Current Assignee Address: SG Singapore
- Main IPC: B65B3/06
- IPC: B65B3/06
Abstract:
A photoresist delivery system includes a photoresist pump, a photoresist reservoir coupled to the photoresist pump, and a photoresist container. A control valve is between the photoresist reservoir and the photoresist container and is movable from a closed position to an open position upon engagement of the photoresist container with the photoresist reservoir to replenish photoresist therein.
Public/Granted literature
- US09091924B2 Photoresist delivery system including control valve and associated methods Public/Granted day:2015-07-28
Information query
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